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UCLA Nanolab Mask Shop

Mask Status

Please note, all wait times are approximate and subject to change, based upon current number of orders. Once your order is ready you will receive a confirmation email. Please allow between 1-3 days for your mask to be completed, with an additional 1-2 days if your order is shipped. If you have any questions please email maskshop@seas.ucla.edu.

Run#NameReceived DateStatusEst. Write Time (hours)Total Write Time (hours:min)Finished DateFedEx Tracking #File Name
3819D. Ren6/22/2017Waiting29/9/9999IAR Full mask (Huffaker Lab) Ed2.gds
3818A_ISQ_V76/21/2017Waiting59/9/9999ISQ_test_structure_v7_UCLA[negPR]
3817A_ISQ_V76/21/2017Waiting59/9/9999ISQ_test_structure_v7_UCLA.dxf [metal1]
3816S. Cakmakyapan6/16/2017Done116/21/2017gate_etch_SDD.gds
3815K. Wong6/16/2017Done116/21/2017Split_gate_masks_Final_V2.cif
3814L. Wei6/16/2017Done116/21/2017lwa_step_test_case.gds
3813Y. Kung6/16/2017Done116/15/2017AIO_D1_nanolab.dxf
3812X. Wen6/9/2017Done53.56/21/2017Mask3_XW_Probe.gds
3811Y. Kung6/9/2017Done116/15/2017Con_D4_nanolab.dxf
3810K. Huang6/9/2017Done116/16/201720170606_single cell trap_final_1.dxf
3809D. Schneider6/9/2017Done116/17/2017PiezoChipxFinal.gds
3808Y. Kung5/31/2017Done116/2/20175th_Gen.dxf
3807L. Wei5/31/2017Done116/1/2017indvl_bias_litho_vias.gds
3806S. Tsai5/31/2017Done2.52.56/1/2017Gr_Pseudofield_ForSmallActiveRegion.gds
3805C. Chang5/30/2017Done226/2/2017LCI.gds
3804J. Hur5/30/2017Done525/31/2017wafer_SU8_15um_unflatten.gds
3803Z. Wan5/30/2017Done335/26/2017TWV_v2.cid
3802C. Chang5/24/2017Done74.55/31/2017pEP3_final.gds [46 ME1]
3801C. Chang5/24/2017Done74.55/31/2017pEP3_final.gds [48 ME2]
3800C. Chang5/24/2017Done74.55/31/2017pEP3_final.gds [52 ME4]
3799Y. Lin5/24/2017Done445/27/2017YJ_Mask_2_051717.gds
3798Y. Lin5/24/2017Done445/27/2017YJ_Mask_1_051717.gds
3797A. Navabi5/24/2017Done115/24/2017Nonlocal_spin_transport_submit.gds
3796S. Tsai5/22/2017Done54.55/24/2017HET_SmallActiveRegion.gds
3795Y. Li5/19/2017Done1.51.55/22/2017NiCr monitor small mask plate.gds
3794Y. Liu5/19/2017Done32.55/22/2017silver_gold.dxf
3793S. Tsai5/19/2017Done425/22/2017Gr_Pseudofield_2.gds
3792Y. Li5/17/2017Done1.51.55/20/2017v-groove test-mask2.gds
3791X. Wen5/13/2017Done555/19/2017Backside_Fluid_XWEN.gds
3790K. Tung5/13/2017Done225/19/2017Acoustic_Device_6_Final.dxf
3789Y. Kung5/11/2017Done115/12/201720170510_single cell trap_final_2.dxf
3788M. Aygar [McGill]5/8/2017Done545/12/2017melis_mask.gds
3787V. Tayari [McGill]5/8/2017Done545/11/2017Vahid_mask.gds
3786Y. Liu5/8/2017Done6.565/11/2017transfer.dxf
3785Y. Li5/4/2017Done2.525/5/2017NiCr_monitor-mask2.gds
3784Y.Li5/4/2017Done2.525/5/2017NiCr_monitor-mask1.gds
3783X. Li4/28/2017Done114/29/2017mask 2_via.gds
3782X. Li4/28/2017Done114/29/2017mask 1_antenna.gds
3781J. Richard4/27/2017Done754/29/2017double_width_wafer_channels_J_Richard_v8.dxf
3780Y. Li4/27/2017Done225/3/2017DML_XMD_tapered_submount_mask2_new2.gds
3779Y. Li4/27/2017Done225/3/2017v-groove mask.gds
3778Y. Li4/27/2017Done2.525/3/2017DML-XMD_tapered_submount-mask1.gds
377705054/27/2017Done65.54/29/2017Metal#2.dxf
377605054/27/2017Done65.54/28/2017Polyimide#2.dxf
377505054/27/2017Done65.54/26/2017Metal#1.dxf
377405054/27/2017Done65.54/28/2017Polyimide#1.dxf
3773T. Man4/25/2017Done224/28/2017Delivery_8_10_12um.cif
3772C. Zhao4/24/2017Done764/26/2017mask_czzhao_03192017_E2.dxf
3771P. Chung4/21/2017Done5.554/24/2017kylie_042117_heater.gds
3770Q. Wang4/20/2017Done21.54/28/2017Spin_Wave_QC_v2_Ni_Layer.gds
3769S. Cakmakyapan4/20/2017Done114/26/2017mask_newpads.gds
3768P. Lu4/19/2017Done114/24/2017mask_PG_20170418.gds
3767Q. Wang4/19/2017Done444/19/2017SW_300MHz_QC_v2_OpticalMask.gds
3766R. Laghumavarapu4/12/2017Done624/16/2017Mesa_pattern_for_etch_Reeentek.gds
3765P. Lu4/12/2017Done554/18/2017SAF_Gate_V2.gds
3764P. Lu4/12/2017Done554/16/2017SAF_SD_V2.gds
3763J. Schneider4/3/2017Done6.554/4/2017waveSpeedTestV1.gds
3762T. Liu4/3/2017Done114/4/2017DEP_Metal_Cu_Plating.gds
3761A. Ng4/3/2017Waiting9/9/9999DLD-Celltrap_v5.dxf
3760Y. li4/3/2017Done224/11/201720G_FC_submount_mask_2.gds
3759Y. Li4/3/2017Done224/11/201720G_FC_submount_mask_1.gds
3758P. Lu4/3/2017Done114/7/2017SAF_AA_V2.gds
3757P. Lu4/3/2017Done554/3/2017SAF_AA_V2.gds
3756R. Strittmatter4/3/2017Done214/4/2017Activation_Mask.gds
3755D. Turan3/28/2017Done113/28/2017ShadowmaskSource + ViaSource.gds
3754D. Turan3/28/2017Done113/28/2017thickMetalSource+BiasLinesMaskSource.gds
3753J. Ng3/24/2017Done553/28/2017NGJimmy_RibbonDesignOptimization.gds
3752D. Turan3/22/2017Done113/24/2017FPAShadow+ViaMask.gds
3751D. Turan3/22/2017Done113/24/2017FPABiasLineMask.gds
3750K. Scharnhorst3/16/2017Done443/21/2017KSS_ASN_Pt_50-200_1.cif [Layer 2]
3749K. Scharnhorst3/16/2017Done443/21/2017KSS_ASN_Pt_50-200_1.cif [Layer 1]
3748T. Liu3/14/2017Done21.53/14/2017DEP_Metal_Liftoff_IR.gds
3747Y. Liu3/14/2017Done54.53/14/2017chuancheng.gds
3746N. Yardimci3/14/2017Done113/14/2017lt_dbr_igaas_c2.gds
3745A. Navabi3/8/2017Done213/14/2017SW_amp_v22_20170306_submitv3.gds
3744N. Yardimci3/8/2017Done113/1/2017correction_dbr_ingaas.gds
3743Y. Kung3/8/2017Done113/8/2017Con_D3_nanolab.dxf
3742Y. Kung3/1/2017Done113/2/2017Con_D2_nanolab.dxf
3741Q. Wang3/1/2017Done223/3/2017PCB_mask_3by3_QC.gds
3740P. Lu3/1/2017Done223/2/2017MoS2_SAF_V1.gds
3739C. Chang2/23/2017Done6.563/3/2017pEP2_final.gds [ME4]
3738C. Chang2/23/2017Done6.563/1/2017pEP2_final.gds [ME2]
3737C. Chang2/23/2017Done6.563/1/2017pEP2_final.gds [ME1]
3736...2/23/2017Waiting9/9/9999
3735S. Tiwari2/23/2017Done6.562/28/2017STXM1_PZO_v3-1.gds
3734S. Tiwari2/23/2017Done6.562/28/2017STXM1_MAG_v5-1.gds
3733S. Tiwari2/23/2017Done6.562/25/2017STXM1_TE_v4-1.gds
3732S. Tiwari2/23/2017Done6.562/24/2017STXM1_VIA_v2-1.gds
3731A_ISQ2/23/2017Done66.53/8/2017NegPR.dxf
3730A_ISQ2/23/2017Done6.56.52/23/2017Metal2.dxf
3729A_ISQ2/23/2017Done6.56.52/23/2017Poly2.dxf
3728A_ISQ2/23/2017Done66.52/23/2017Metal1.gds
3727A_ISQ2/23/2017Done662/22/2017Poly1.dxf
3726T. Liu2/23/2017Done222/21/2017DEP_PDMS_TopNoninv_BottomInv.gds
3725T. Liu2/23/2017Done222/23/2017DEP_Metal_TopNoninv_BottomInv.gds
3724Y. Kung2/23/2017Done112/21/2017Con_D1_nanolab.dxf
3723A_Farrell2/23/2017Done112/18/2017MASK_HYBRID_APD.gds
3722S. Tiwari2/10/2017Done6.56.52/13/2017STXM1_BE_v1-1.gds
3721Y. Kung2/7/2017Done112/10/2017ConLasDEP_D1_nanolab.dxf
3720K. Tung2/7/2017Done2.52.52/10/2017Acoustic_Device_5 - 3.dxf


Average Turnaround Time:3.363 Business Days