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UCLA Nanolab Mask Shop

Mask Status

Please note, all wait times are approximate and subject to change, based upon current number of orders. Once your order is ready you will receive a confirmation email. Please allow between 1-3 days for your mask to be completed, with an additional 1-2 days if your order is shipped. If you have any questions please email maskshop@seas.ucla.edu.

Run#NameReceived DateStatusEst. Write Time (hours)Total Write Time (hours:min)Finished DateFedEx Tracking #File Name
3781J. Richard4/27/2017Waiting559/9/9999double_width_wafer_channels_J_Richard_v8.dxf
37804/27/2017Waiting9/9/9999
37794/27/2017Waiting9/9/9999
37784/27/2017Waiting9/9/9999
377705054/27/2017Waiting9/9/9999Metal#2.dxf
377605054/27/2017Done65.54/28/2017Polyimide#2.dxf
377505054/27/2017Done65.54/26/2017Metal#1.dxf
377405054/27/2017Done65.54/28/2017Polyimide#1.dxf
3773T. Man4/25/2017Done224/28/2017Delivery_8_10_12um.cif
3772C. Zhao4/24/2017Done764/26/2017mask_czzhao_03192017_E2.dxf
3771P. Chung4/21/2017Done5.554/24/2017kylie_042117_heater.gds
3770Q. Wang4/20/2017Done21.54/28/2017Spin_Wave_QC_v2_Ni_Layer.gds
3769S. Cakmakyapan4/20/2017Done114/26/2017mask_newpads.gds
3768P. Lu4/19/2017Done114/24/2017mask_PG_20170418.gds
3767Q. Wang4/19/2017Done444/19/2017SW_300MHz_QC_v2_OpticalMask.gds
3766R. Laghumavarapu4/12/2017Done624/16/2017Mesa_pattern_for_etch_Reeentek.gds
3765P. Lu4/12/2017Done554/18/2017SAF_Gate_V2.gds
3764P. Lu4/12/2017Done554/16/2017SAF_SD_V2.gds
3763J. Schneider4/3/2017Done6.554/4/2017waveSpeedTestV1.gds
3762T. Liu4/3/2017Done114/4/2017DEP_Metal_Cu_Plating.gds
3761A. Ng4/3/2017Waiting9/9/9999DLD-Celltrap_v5.dxf
3760Y. li4/3/2017Done224/11/201720G_FC_submount_mask_2.gds
3759Y. Li4/3/2017Done224/11/201720G_FC_submount_mask_1.gds
3758P. Lu4/3/2017Done114/7/2017SAF_AA_V2.gds
3757P. Lu4/3/2017Done554/3/2017SAF_AA_V2.gds
3756R. Strittmatter4/3/2017Done214/4/2017Activation_Mask.gds
3755D. Turan3/28/2017Done113/28/2017ShadowmaskSource + ViaSource.gds
3754D. Turan3/28/2017Done113/28/2017thickMetalSource+BiasLinesMaskSource.gds
3753J. Ng3/24/2017Done553/28/2017NGJimmy_RibbonDesignOptimization.gds
3752D. Turan3/22/2017Done113/24/2017FPAShadow+ViaMask.gds
3751D. Turan3/22/2017Done113/24/2017FPABiasLineMask.gds
3750K. Scharnhorst3/16/2017Done443/21/2017KSS_ASN_Pt_50-200_1.cif [Layer 2]
3749K. Scharnhorst3/16/2017Done443/21/2017KSS_ASN_Pt_50-200_1.cif [Layer 1]
3748T. Liu3/14/2017Done21.53/14/2017DEP_Metal_Liftoff_IR.gds
3747Y. Liu3/14/2017Done54.53/14/2017chuancheng.gds
3746N. Yardimci3/14/2017Done113/14/2017lt_dbr_igaas_c2.gds
3745A. Navabi3/8/2017Done213/14/2017SW_amp_v22_20170306_submitv3.gds
3744N. Yardimci3/8/2017Done113/1/2017correction_dbr_ingaas.gds
3743Y. Kung3/8/2017Done113/8/2017Con_D3_nanolab.dxf
3742Y. Kung3/1/2017Done113/2/2017Con_D2_nanolab.dxf
3741Q. Wang3/1/2017Done223/3/2017PCB_mask_3by3_QC.gds
3740P. Lu3/1/2017Done223/2/2017MoS2_SAF_V1.gds
3739C. Chang2/23/2017Done6.563/3/2017pEP2_final.gds [ME4]
3738C. Chang2/23/2017Done6.563/1/2017pEP2_final.gds [ME2]
3737C. Chang2/23/2017Done6.563/1/2017pEP2_final.gds [ME1]
3736...2/23/2017Waiting9/9/9999
3735S. Tiwari2/23/2017Done6.562/28/2017STXM1_PZO_v3-1.gds
3734S. Tiwari2/23/2017Done6.562/28/2017STXM1_MAG_v5-1.gds
3733S. Tiwari2/23/2017Done6.562/25/2017STXM1_TE_v4-1.gds
3732S. Tiwari2/23/2017Done6.562/24/2017STXM1_VIA_v2-1.gds
3731A_ISQ2/23/2017Done66.53/8/2017NegPR.dxf
3730A_ISQ2/23/2017Done6.56.52/23/2017Metal2.dxf
3729A_ISQ2/23/2017Done6.56.52/23/2017Poly2.dxf
3728A_ISQ2/23/2017Done66.52/23/2017Metal1.gds
3727A_ISQ2/23/2017Done662/22/2017Poly1.dxf
3726T. Liu2/23/2017Done222/21/2017DEP_PDMS_TopNoninv_BottomInv.gds
3725T. Liu2/23/2017Done222/23/2017DEP_Metal_TopNoninv_BottomInv.gds
3724Y. Kung2/23/2017Done112/21/2017Con_D1_nanolab.dxf
3723A_Farrell2/23/2017Done112/18/2017MASK_HYBRID_APD.gds
3722S. Tiwari2/10/2017Done6.56.52/13/2017STXM1_BE_v1-1.gds
3721Y. Kung2/7/2017Done112/10/2017ConLasDEP_D1_nanolab.dxf
3720K. Tung2/7/2017Done2.52.52/10/2017Acoustic_Device_5 - 3.dxf
3719K. Tung2/7/2017Done2.52.52/10/2017Acoustic_Device_5 - 2.dxf
3718K. Tung2/7/2017Done2.52.52/8/2017Acoustic_Device_5 - 1.dxf
3717P. Lu2/7/2017Done112/8/2017mask20170131.gds
3716Q. Wang2/7/2017Done6.56.52/8/2017SW_300MHz_QC_v1_OpticalMask.gds
3715N. Yardimci2/7/2017Done112/10/2017LT_LithoMask.gds
3714N. Yardimci2/7/2017Done112/10/2017erasingaasLithoMask.gds
3713N. Yardimci2/7/2017Done112/10/2017dbrLithoMask.gds
3712Y. Li2/3/2017Done112/3/2017deep_etch_test_final.gds
3711K. Wong2/3/2017Done112/3/2017Kin_Rfpads2.cif
3710Q. Zhao2/1/2017Done222/2/2017SNM_APDSL_v10_EbeamAlignMarker.gds
3709Q. Zhao2/1/2017Done662/2/2017SNM_APDSL_v10_DicingMask.gds
3708M. Chavez2/1/2017Done21.52/18/2017Biogenic_Chip_SU8_design_7_MSC.dxf
3707M. Chavez2/1/2017Done21.52/18/2017778462158519Biogenic_Chip_ITO_design_7_MSC.dxf
3706D. Turan1/31/2017Done221/31/2017AntennaMask.gds
3705Y. Lin1/30/2017Done1.512/13/2017transfer_Au
3704M. Xu1/30/2017Done221/31/2017P200GF90.cif
3703M. Xu1/28/2017Done221/31/2017P100GF95.cif
3702M. Xu1/28/2017Done221/31/2017P100GF90.cif
3701M. Xu1/28/2017Done221/31/2017fepP200GF10.cif
3700M.xu1/28/2017Done221/31/2017fepP100GF10.cif
3699J. Soto1/28/2017Done6.561/31/2017778322105335SongLi_UCLA_Printing.dxf
3698K. Wong1/23/2017Done111/24/2017Kin_RFpads_PHOTO.cif
3697Y. Kung1/20/2017Done111/24/2017DOP_HI_D3_concern_nanolab.dxf
3696P. Lu1/20/2017Done111/27/2017mask20170120.gds
3695J. Kim1/18/2017Done3.53.51/23/2017778255818506ModifiedRIMChip_Ver6.dxf
3694B. Freeman1/14/2017Done1.51.51/14/2017FREEMAN_ACCM_MASK2.gds
3693I. Pushkarsky1/11/2017Done6+281/11/201750X_Complete.cif
3692Y. Kung1/5/2017Done111/5/2017DEP_HI_D2_nanolab.dxf
3691Y. Li12/21/2016Done1112/23/2016CVDD_TOSA_final_20161220-2.gds
3690Y. Li12/21/2016Done2112/23/2016CVDD_TOSA_final_20161220-1.gds
3689Y. Li12/14/2016Done1.5112/14/2016CVDD_mount_final_20161208.gds
3688Y. Li12/14/2016Done1.5112/14/2016CVDD_TOSA_mount_final_20161208.gds
3687M. Ouyang12/8/2016Done6.5612/8/2016uSEA_1.0_E.dxf
3686M. Ouyang12/8/2016Done6.5612/8/2016uSEA_2.0_E.dxf
3685C. Zhao12/7/2016Done7612/4/2016mask_czzhao_12012016_v2.dxf
3684Y. Kung12/7/2016Done1112/6/2016DEP_HI_D1_nanolab_v2.dxf
3683J. Lodico12/7/2016Done4412/9/2016IntercalationSlidesFinal1.dxf
3682C. Liu11/29/2016Done3.5311/30/2016MEMS_Drive_2016_1130.dxf


Average Turnaround Time:3.395 Business Days