Nanolab
Labrunner Labrunner
Sign In

UCLA Nanolab Mask Shop

Mask Status

Please note, all wait times are approximate and subject to change, based upon current number of orders. Once your order is ready you will receive a confirmation email. Please allow between 1-3 days for your mask to be completed, with an additional 1-2 days if your order is shipped. If you have any questions please email maskshop@seas.ucla.edu.

Run#NameReceived DateStatusEst. Write Time (hours)Total Write Time (hours:min)Finished DateFedEx Tracking #File Name
3853B. Freeman8/19/2017Waiting19/9/9999FREEMAN_ACCM_HYBRID_TG_MASK.GDS
3852A. Hanna8/19/2017Done6.568/21/2017
3851A. Hanna8/19/2017Done668/21/2017
3850Y. Kung8/17/2017Done118/21/2017BF_D7_nanolab.dxf
3849P. Lu8/15/2017Done668/17/2017CdTe_V1.gds
3848X. Wen8/15/2017Done668/17/2017Mask2_XW_Probe_v4_2.gds
3847Y. Kung8/11/2017Done118/16/2017BF_D6_nanolab.dxf
3846M. Haw8/11/2017Done338/14/2017wrinkle_cspots_align_L30L50.gds [L30]
3845M. Haw8/11/2017Done338/14/2017wrinkle_cspots_align_L30L50.gds [L50]
3844B. Chen8/2/2017Done668/11/2017layoutfinal.dxf
3843D. Ren8/2/2017Waiting19/9/9999DR_EBeam_11_Mask_ForPDs.gds
3842X. Wen8/1/2017Done668/2/2017Mask1_XW_Probe_V4.gds
3841Z. Xiao7/28/2017Done118/1/2017072717TD_disk_design.gds
3840L. Cai7/26/2017Done448/16/2017TFT-array-final-Etch_passivation.gds
3839L. Cai7/26/2017Done448/16/2017TFT-array-final-S_D.gds
3838L. Cai7/26/2017Done448/11/2017TFT-array-final-channel.gds
3837L. Cai7/26/2017Done448/14/2017TFT-array-final-gate.gds
3836X. Li7/26/2017Done2.528/1/2017Mask_Xu_li.gds
3835K. Huang7/25/2017Done117/25/201720170724_G2_3.dxf
3834Q. Wang7/21/2017Done447/26/2017SW_stepper_step2and3_QC.gds
3833L. Cai7/20/2017Done117/21/2017Mask-for-fabrication-gate.gds
3832L. Cai7/20/2017Done117/21/2017Mask-for-fabrication-S_D.gds
3831L. Cai7/20/2017Done117/22/2017Mask-for-fabrication-Etch_Passivation.gds
3830Y. Kung7/18/2017Done21.57/19/2017AIO_D1_E.dxf
3829T. Liu7/18/2017Done227/19/2017DEPv2_MetalMask_Inv.gds
3828T. Liu7/18/2017Done227/19/2017DEPv2m_PDMS_TopNoninv_BottomInv.gds
3827Y. Liu7/17/2017Done337/19/2017new_transfer.dxf
3826K. Huang7/13/2017Done1.517/14/201720170711_G2.dxf
3825L. Cai7/13/2017Done117/21/2017Mask-for-fabrication-Etch_Channel.gds
3824C. Zheng7/6/2017Done117/10/2017Final_Mask.gds
3823W. Hubbard6/30/2017Done7.567/3/2017KOHMask20vFinal.dxf
3822W. Hubbard6/30/2017Done7.567/3/2017ElectrodeMask20vFinal.dxf
3821D. Nathan6/29/2017Done337/3/2017DN_ChargeStorage7umv3.cif
3820Y. Kung6/26/2017Done116/27/2017BF_D5_nanolab.dxf
3819D. Ren6/22/2017Done216/26/2017IAR Full mask (Huffaker Lab) Ed2.gds
3818A_ISQ_V76/21/2017Done54.56/22/2017ISQ_test_structure_v7_UCLA[negPR]
3817A_ISQ_V76/21/2017Done54.56/22/2017ISQ_test_structure_v7_UCLA.dxf [metal1]
3816S. Cakmakyapan6/16/2017Done116/21/2017gate_etch_SDD.gds
3815K. Wong6/16/2017Done116/21/2017Split_gate_masks_Final_V2.cif
3814L. Wei6/16/2017Done116/21/2017lwa_step_test_case.gds
3813Y. Kung6/16/2017Done116/15/2017AIO_D1_nanolab.dxf
3812X. Wen6/9/2017Done53.56/21/2017Mask3_XW_Probe.gds
3811Y. Kung6/9/2017Done116/15/2017Con_D4_nanolab.dxf
3810K. Huang6/9/2017Done116/16/201720170606_single cell trap_final_1.dxf
3809D. Schneider6/9/2017Done116/17/2017PiezoChipxFinal.gds
3808Y. Kung5/31/2017Done116/2/20175th_Gen.dxf
3807L. Wei5/31/2017Done116/1/2017indvl_bias_litho_vias.gds
3806S. Tsai5/31/2017Done2.52.56/1/2017Gr_Pseudofield_ForSmallActiveRegion.gds
3805C. Chang5/30/2017Done226/2/2017LCI.gds
3804J. Hur5/30/2017Done525/31/2017wafer_SU8_15um_unflatten.gds
3803Z. Wan5/30/2017Done335/26/2017TWV_v2.cid
3802C. Chang5/24/2017Done74.55/31/2017pEP3_final.gds [46 ME1]
3801C. Chang5/24/2017Done74.55/31/2017pEP3_final.gds [48 ME2]
3800C. Chang5/24/2017Done74.55/31/2017pEP3_final.gds [52 ME4]
3799Y. Lin5/24/2017Done445/27/2017YJ_Mask_2_051717.gds
3798Y. Lin5/24/2017Done445/27/2017YJ_Mask_1_051717.gds
3797A. Navabi5/24/2017Done115/24/2017Nonlocal_spin_transport_submit.gds
3796S. Tsai5/22/2017Done54.55/24/2017HET_SmallActiveRegion.gds
3795Y. Li5/19/2017Done1.51.55/22/2017NiCr monitor small mask plate.gds
3794Y. Liu5/19/2017Done32.55/22/2017silver_gold.dxf
3793S. Tsai5/19/2017Done425/22/2017Gr_Pseudofield_2.gds
3792Y. Li5/17/2017Done1.51.55/20/2017v-groove test-mask2.gds
3791X. Wen5/13/2017Done555/19/2017Backside_Fluid_XWEN.gds
3790K. Tung5/13/2017Done225/19/2017Acoustic_Device_6_Final.dxf
3789Y. Kung5/11/2017Done115/12/201720170510_single cell trap_final_2.dxf
3788M. Aygar [McGill]5/8/2017Done545/12/2017melis_mask.gds
3787V. Tayari [McGill]5/8/2017Done545/11/2017Vahid_mask.gds
3786Y. Liu5/8/2017Done6.565/11/2017transfer.dxf
3785Y. Li5/4/2017Done2.525/5/2017NiCr_monitor-mask2.gds
3784Y.Li5/4/2017Done2.525/5/2017NiCr_monitor-mask1.gds
3783X. Li4/28/2017Done114/29/2017mask 2_via.gds
3782X. Li4/28/2017Done114/29/2017mask 1_antenna.gds
3781J. Richard4/27/2017Done754/29/2017double_width_wafer_channels_J_Richard_v8.dxf
3780Y. Li4/27/2017Done225/3/2017DML_XMD_tapered_submount_mask2_new2.gds
3779Y. Li4/27/2017Done225/3/2017v-groove mask.gds
3778Y. Li4/27/2017Done2.525/3/2017DML-XMD_tapered_submount-mask1.gds
377705054/27/2017Done65.54/29/2017Metal#2.dxf
377605054/27/2017Done65.54/28/2017Polyimide#2.dxf
377505054/27/2017Done65.54/26/2017Metal#1.dxf
377405054/27/2017Done65.54/28/2017Polyimide#1.dxf
3773T. Man4/25/2017Done224/28/2017Delivery_8_10_12um.cif
3772C. Zhao4/24/2017Done764/26/2017mask_czzhao_03192017_E2.dxf
3771P. Chung4/21/2017Done5.554/24/2017kylie_042117_heater.gds
3770Q. Wang4/20/2017Done21.54/28/2017Spin_Wave_QC_v2_Ni_Layer.gds
3769S. Cakmakyapan4/20/2017Done114/26/2017mask_newpads.gds
3768P. Lu4/19/2017Done114/24/2017mask_PG_20170418.gds
3767Q. Wang4/19/2017Done444/19/2017SW_300MHz_QC_v2_OpticalMask.gds
3766R. Laghumavarapu4/12/2017Done624/16/2017Mesa_pattern_for_etch_Reeentek.gds
3765P. Lu4/12/2017Done554/18/2017SAF_Gate_V2.gds
3764P. Lu4/12/2017Done554/16/2017SAF_SD_V2.gds
3763J. Schneider4/3/2017Done6.554/4/2017waveSpeedTestV1.gds
3762T. Liu4/3/2017Done114/4/2017DEP_Metal_Cu_Plating.gds
3761A. Ng4/3/2017Waiting9/9/9999DLD-Celltrap_v5.dxf
3760Y. li4/3/2017Done224/11/201720G_FC_submount_mask_2.gds
3759Y. Li4/3/2017Done224/11/201720G_FC_submount_mask_1.gds
3758P. Lu4/3/2017Done114/7/2017SAF_AA_V2.gds
3757P. Lu4/3/2017Done554/3/2017SAF_AA_V2.gds
3756R. Strittmatter4/3/2017Done214/4/2017Activation_Mask.gds
3755D. Turan3/28/2017Done113/28/2017ShadowmaskSource + ViaSource.gds
3754D. Turan3/28/2017Done113/28/2017thickMetalSource+BiasLinesMaskSource.gds


Average Turnaround Time:3.334 Business Days