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UCLA Nanolab Mask Shop

Mask Status

Please note, all wait times are approximate and subject to change, based upon current number of orders. Once your order is ready you will receive a confirmation email. Please allow between 1-3 days for your mask to be completed, with an additional 1-2 days if your order is shipped. If you have any questions please email maskshop@seas.ucla.edu.

Run#NameReceived DateStatusEst. Write Time (hours)Total Write Time (hours:min)Finished DateFedEx Tracking #File Name
3918D. Turan11/22/2017Done1111/22/2017BiasLineMask_V2.gds
3917S. Tsai11/21/2017Waiting2.59/9/9999GrPsuedofield_ForSmallActiveRegion.gds
3916A. Chavez11/19/2017Done1111/20/2017chavez_micron2.gds
3915A. Chavez11/19/2017Done54.511/20/2017micron_mask.gds
3914M. Andonian11/19/2017Done2111/21/2017Si_Disk&Spacers.dxf
3913M. Andonian11/19/2017Done3211/21/2017SU8.dxf
3912M. Andonian11/19/2017Done5511/17/2017Electrodes.dxf
3911A. Hanna11/17/2017Done6.55.511/19/2017Mask#5.gds
3910A. Hanna11/17/2017Done6.55.511/19/2017Mask#4.gds [Metalization]
3909A. Hanna11/17/2017Done6.55.511/17/2017Mask#3.gds [Etch Holes]
3908A. Hanna11/17/2017Done6.55.511/14/2017Mask#2.gds [Corrugation Mask]
3907A. Hanna11/15/2017Done6.55.511/15/2017Mask#1.gds [Tape Mask]
3906J. Hur11/12/2017Waiting79/9/9999Millibatt2_50um_SU8_5um_Fabricate.cif
3905J. Fan11/9/2017Done3.53.511/15/2017RW2P4L200W250A.dxf [MESA]
3904H. Wu11/8/2017Done6511/9/2017TSSE-Hall Bar.gds
3903L. Cai10/30/2017Done1.51.510/31/2017Array-S-D_new_on_glass.gds
3902L. Cai10/30/2017Done43.511/1/2017TFT-array-marks-only.gds
3901Z. Chen10/30/2017Done8411/8/20172T1C pixel-25x25-1024.dxf [PIX]
3900Z. Chen10/30/2017Done8611/8/20172T1C pixel-25x25-1024.dxf [VIA]
3899Z. Chen10/30/2017Done8611/3/20172T1C pixel-25x25-1024.dxf [CNT]
3898Z. Chen10/30/2017Done8611/1/20172T1C pixel-25x25-1024.dxf [GATE]
3897Z. Chen10/30/2017Done8610/31/20172T1C pixel-25x25-1024.dxf [SD]
3896K. Huang10/26/2017Done1110/27/201720171025_SCT_G3_2_MC.dxf
3895K. Huang10/26/2017Done1110/27/201720171025_SCT_G3_2_SC.dxf
3894B. Chen10/26/2017Done6.55.510/27/2017microchannels_curved.dxf
3893B. Freeman10/23/2017Done1110/24/2017FREEMAN_ACCM_HYBRID_TG_MASKv2.GDS
3892A. Navabi10/23/2017Done1110/24/2017YIG_amp_5_submit.gds
3891K. Chung10/23/2017Done6510/24/2017Kylie_20171019_Droplet_generator.dxf
3890B. Chen10/23/2017Done6.5511/9/2017micropillars.dxf
3889J. Hur10/18/2017Done7510/19/2017Millibatt2_100um_SU87pt5.cif
3888D. Turan10/18/2017Done1110/18/2017Etch_Mask.gds
3887Kuan-Wen Tung10/17/2017Done2210/17/2017Acoustic_Device_7_Final.dxf
3886D. Turan10/17/2017Done1110/18/2017Metal_Mask.gds
3885N. Penthorn10/11/2017Done21.510/17/2017NIL_mask_01.gds
3884N. Penthorn10/11/2017Done21.510/17/2017NIL_mask_02.gds
3883Z. Wan10/6/2017Done5510/12/2017new_mask.gds
3882M. Xiao10/6/2017Done2210/8/20171006Mask_maggie.gds
3881Y. Kung10/6/2017Done1110/7/2017BF_D6_2_nanolab.dxf
3880J. Hur10/3/2017Done6.5510/2/2017Millibatt2_100um_SU8.cif
3879J. Hur10/3/2017Done6.5510/2/2017Millibatt2_100um_Si.cif
3878Y. Kung9/30/2017Done119/30/2017AIO_D2_BF_nanolab.dxf
3877R. Forrest9/28/2017Done1179/28/2017601137B_data-metric_2007.dxf
3876R. Forrest9/28/2017Done1179/28/2017770376769938601137B_data-metric_2007.dxf
3875J. Richard9/27/2017Done21.59/27/2017Channel_guides.dxf
3874Y. Chow9/22/2017Done769/27/2017design-50um.dxf
3873T. Liu9/22/2017Done229/22/2017DEPv3_PDMS_TopNoninv_BottomInv.gds
3872T. Liu9/22/2017Done229/22/2017DEPv3_MetalMask_Inv.gds
3871G. Yu9/22/2017Done119/21/2017LSSE-Hall Bar-submitted.cif
3870Q. Wang9/15/2017Done449/22/2017SW_stepper_step2and3_QC_v2.gds
3869K. Huang9/14/2017Done119/15/201720170913_SCT_G3_1.dxf
3868P. Chung9/12/2017Done759/15/2017Kylie_091117_CMUT.gds
3867T. Man9/12/2017Done229/15/2017Delivery_8um_5um_opening.cif
3866J. Hu9/12/2017Done649/14/2017Jinzhao_Hu_V1.gds
3865Z. Wan9/6/2017Done559/9/2017mask_dicing.gds
3864W. Li9/3/2017Done339/5/2017capacitor_weicong_li.gds
3863Y. Kung9/1/2017Done119/1/2017AIO_D2_nanolab.dxf
3862A. Navabi9/1/2017Done219/1/2017YIG_amp_4_submit.gds
3861J. Hur8/29/2017Done6.559/1/2017Millibatt2_Fabricate_SU8.gds
3860J. Hur8/29/2017Done6.559/1/2017Millibatt2_Fabricate_Siwafer.gds
3859J. Wu8/29/2017Done6.569/1/2017mu4_MET2_082917.gds
3858B. Freeman8/29/2017Done21.58/31/2017FREEMAN_2BAMBI_MASK_2.gds
3857B. Freeman8/29/2017Done21.58/31/2017FREEMAN_2BAMBI_MASK_1.gds
3856R. Forrest8/26/2017Done86.58/28/2017601065ADATA_A1.dxf
3855Y. Kung8/25/2017Done118/25/2017BF_D8_nanolab.dxf
3854Q. Wang8/21/2017Done118/25/2017MeSOT_v1.gds
3853B. Freeman8/19/2017Done118/19/2017FREEMAN_ACCM_HYBRID_TG_MASK.GDS
3852A. Hanna8/19/2017Done6.568/21/2017die_mask_7_20_2017.gds
3851A. Hanna8/19/2017Done668/21/2017tape_mask_8_17_2017.gds
3850Y. Kung8/17/2017Done118/21/2017BF_D7_nanolab.dxf
3849P. Lu8/15/2017Done668/17/2017CdTe_V1.gds
3848X. Wen8/15/2017Done668/17/2017Mask2_XW_Probe_v4_2.gds
3847Y. Kung8/11/2017Done118/16/2017BF_D6_nanolab.dxf
3846M. Haw8/11/2017Done338/14/2017wrinkle_cspots_align_L30L50.gds [L30]
3845M. Haw8/11/2017Done338/14/2017wrinkle_cspots_align_L30L50.gds [L50]
3844B. Chen8/2/2017Done668/11/2017layoutfinal.dxf
3843D. Ren8/2/2017Done108/3/2017DR_EBeam_11_Mask_ForPDs.gds
3842X. Wen8/1/2017Done668/2/2017Mask1_XW_Probe_V4.gds
3841Z. Xiao7/28/2017Done118/1/2017072717TD_disk_design.gds
3840L. Cai7/26/2017Done448/16/2017TFT-array-final-Etch_passivation.gds
3839L. Cai7/26/2017Done448/16/2017TFT-array-final-S_D.gds
3838L. Cai7/26/2017Done448/11/2017TFT-array-final-channel.gds
3837L. Cai7/26/2017Done448/14/2017TFT-array-final-gate.gds
3836X. Li7/26/2017Done2.528/1/2017Mask_Xu_li.gds
3835K. Huang7/25/2017Done117/25/201720170724_G2_3.dxf
3834Q. Wang7/21/2017Done447/26/2017SW_stepper_step2and3_QC.gds
3833L. Cai7/20/2017Done117/21/2017Mask-for-fabrication-gate.gds
3832L. Cai7/20/2017Done117/21/2017Mask-for-fabrication-S_D.gds
3831L. Cai7/20/2017Done117/22/2017Mask-for-fabrication-Etch_Passivation.gds
3830Y. Kung7/18/2017Done21.57/19/2017AIO_D1_E.dxf
3829T. Liu7/18/2017Done227/19/2017DEPv2_MetalMask_Inv.gds
3828T. Liu7/18/2017Done227/19/2017DEPv2m_PDMS_TopNoninv_BottomInv.gds
3827Y. Liu7/17/2017Done337/19/2017new_transfer.dxf
3826K. Huang7/13/2017Done1.517/14/201720170711_G2.dxf
3825L. Cai7/13/2017Done117/21/2017Mask-for-fabrication-Etch_Channel.gds
3824C. Zheng7/6/2017Done117/10/2017Final_Mask.gds
3823W. Hubbard6/30/2017Done7.567/3/2017KOHMask20vFinal.dxf
3822W. Hubbard6/30/2017Done7.567/3/2017ElectrodeMask20vFinal.dxf
3821D. Nathan6/29/2017Done337/3/2017DN_ChargeStorage7umv3.cif
3820Y. Kung6/26/2017Done116/27/2017BF_D5_nanolab.dxf
3819D. Ren6/22/2017Done216/26/2017IAR Full mask (Huffaker Lab) Ed2.gds


Average Turnaround Time:3.283 Business Days