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Orentation Lab Walkthru Scheduled Event University Holiday Training Session

Sun Mon Tues Wed Thurs Fri Sat
1
2
3:00 PM
Training Session: M_Probe_C - Meas Probe - M & M (CNSI)
3:45 PM
Training Session: M_SEM_Hitachi - Meas SEM - Hitachi S4700 (E-IV)
3:45 PM
Training Session: E_Asher_Matrix - Etch Asher - Matrix 105 (E-IV)
3
4
5
9:30 AM
Training Session: D_Sputter_Desk_V - Dep Sputter - Denton Desk V (CNSI)
12:00 AM
5 PM Deadline for all forms, photos, tests, etc.
6
7
8
9
10
11:00 AM
Zoom Safety Walk
11
12
13
14
15
16
9:00 AM
Training Session: M_Filmtek - Meas Reflectometer - SCI Filmtek 2000 (E-IV)
3:00 PM
Training Session: E_HFVE - Etch HF Vapor - AMMT (E-IV)
17
9:00 AM
Training Session: E_AOE - Etch Fluorine - STS AOE (E-IV)
10:00 AM
Training Session: E_Oxford_C - Etch Fluorine - Oxford 80+ (CNSI)
10:00 AM
Training Session: D_Metal_CHA2_NEW - Dep e-beam Evaporator - CHA Mark 40-2(new) (E-IV)
2:00 PM
Training Session: MI_ScribeBreak - Misc Scribe and Break - Loomis LSD100 (CNSI)
18
10:00 AM
In-Peron Safety Walk
19
9:30 AM
Training Session: E_Oxford_E - Etch Fluorine - Oxford 80+ (E-IV)
10:15 AM
Training Session: E_Cl2_PlasmaTherm_E - Etch Chlorine - PlasmaTherm SLR 770 ICP (E-IV)
11:00 AM
Training Session: E_DRIE_FDRIE - Etch DRIE - PlasmaTherm DSE III FDRIE (E-IV)
1:00 PM
Training Session: E_Asher_Tegal - Etch Asher - Tegal (E-IV)
2:00 PM
Training Session: Training_EIV_Lithography - Training - General Lithography (E-IV)
10:00 AM
In-Person Safety Walk
20
21
22
23
24
10:00 AM
Training Session: MI_Bonder_KSB6_1 - Misc Bonder - Karl Suss SB6-1 (E-IV)
10:00 AM
Training Session: D_Sputter_Discovery - Dep Sputter - Denton Discovery (E-IV)
25
1:30 PM
Training Session: D_Metal_CHA3_CNSI - Dep e-beam Evaporator - CHA Mark 40-3 (CNSI)
1:30 PM
Training Session: M_Probe_C - Meas Probe - M & M (CNSI)
26
9:00 AM
Training Session: M_Wyko - Meas Optical Profiler - Wyko NT3300 (E-IV)
27
28
29
10:00 AM
Training Session: E_Technics - Etch Fluorine - Technics Micro RIE 800 (E-IV)
30

Time	Title	Location	Conducted By
9:00 AM	Training Session: E_AOE - Etch Fluorine - STS AOE (E-IV)	Nanolab	Brian Matthews
10:00 AM	Training Session: E_Oxford_C - Etch Fluorine - Oxford 80+ (CNSI)	Nanolab	Brian Matthews
10:00 AM	Training Session: D_Metal_CHA2_NEW - Dep e-beam Evaporator - CHA Mark 40-2(new) (E-IV)	Nanolab	Hoc Ngo
2:00 PM	Training Session: MI_ScribeBreak - Misc Scribe and Break - Loomis LSD100 (CNSI)	Nanolab	Brian Matthews

Sun	Mon	Tues	Wed	Thurs	Fri	Sat
	1	2 3:00 PM Training Session: M_Probe_C - Meas Probe - M & M (CNSI) 3:45 PM Training Session: M_SEM_Hitachi - Meas SEM - Hitachi S4700 (E-IV) 3:45 PM Training Session: E_Asher_Matrix - Etch Asher - Matrix 105 (E-IV)	3	4	5 9:30 AM Training Session: D_Sputter_Desk_V - Dep Sputter - Denton Desk V (CNSI) 12:00 AM 5 PM Deadline for all forms, photos, tests, etc.	6
7	8	9	10 11:00 AM Zoom Safety Walk	11	12	13
14	15	16 9:00 AM Training Session: M_Filmtek - Meas Reflectometer - SCI Filmtek 2000 (E-IV) 3:00 PM Training Session: E_HFVE - Etch HF Vapor - AMMT (E-IV)	17 9:00 AM Training Session: E_AOE - Etch Fluorine - STS AOE (E-IV) 10:00 AM Training Session: E_Oxford_C - Etch Fluorine - Oxford 80+ (CNSI) 10:00 AM Training Session: D_Metal_CHA2_NEW - Dep e-beam Evaporator - CHA Mark 40-2(new) (E-IV) 2:00 PM Training Session: MI_ScribeBreak - Misc Scribe and Break - Loomis LSD100 (CNSI)	18 10:00 AM In-Peron Safety Walk	19 9:30 AM Training Session: E_Oxford_E - Etch Fluorine - Oxford 80+ (E-IV) 10:15 AM Training Session: E_Cl2_PlasmaTherm_E - Etch Chlorine - PlasmaTherm SLR 770 ICP (E-IV) 11:00 AM Training Session: E_DRIE_FDRIE - Etch DRIE - PlasmaTherm DSE III FDRIE (E-IV) 1:00 PM Training Session: E_Asher_Tegal - Etch Asher - Tegal (E-IV) 2:00 PM Training Session: Training_EIV_Lithography - Training - General Lithography (E-IV) 10:00 AM In-Person Safety Walk	20
21	22	23	24 10:00 AM Training Session: MI_Bonder_KSB6_1 - Misc Bonder - Karl Suss SB6-1 (E-IV) 10:00 AM Training Session: D_Sputter_Discovery - Dep Sputter - Denton Discovery (E-IV)	25 1:30 PM Training Session: D_Metal_CHA3_CNSI - Dep e-beam Evaporator - CHA Mark 40-3 (CNSI) 1:30 PM Training Session: M_Probe_C - Meas Probe - M & M (CNSI)	26 9:00 AM Training Session: M_Wyko - Meas Optical Profiler - Wyko NT3300 (E-IV)	27
28	29 10:00 AM Training Session: E_Technics - Etch Fluorine - Technics Micro RIE 800 (E-IV)	30